General Nanotechnology (GN) has created and is developing hardware and software that provides advanced capabilities in imaging, nano-manipulation, nano-fabrication, nano-spectro-photometry, near field optical probes below the aperture (50nm) limit, and diamond and other nanotools™ tips and parts.
GN is a California Limited Liability Company (LLC). Its principal operational location is in Berkeley, California. GN has partnered with the Lawrence Berkeley National Labs in a three year nanotools™ tips development program.
GN has developed advanced software for mixed Confocal/AF imaging systems. In the Micro-Fab/Coating area, GN is engaged as an Associate of the Berkeley MicroFab laboratories and is developing diamond MEMS, including AFM tips, and nano-machining related special parts.. GN worked with NIST to provide micro-machined force standards for the commercial AFM industry.
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GN's software is used by major manufacturers of Atomic Force and Confocal Microscopy, and in wafer profiling equipment sold to the semi-conductor industry. GN has also developed advanced software capabilities for Light Microscopy, including Laser and Nipkow Disk Confocal imaging systems.
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